Paper
11 March 2008 Influence of substrate temperature on the morphology and thermal resistance of vanadium oxide thin films
Xiongbang Wei, Zhiming Wu, Tao Wang, Xiangdong Xu, Jingjing Tang, Yadong Jiang
Author Affiliations +
Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69842K (2008) https://doi.org/10.1117/12.792154
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
The dependence of morphology and thermal resistance on the substrate temperature during the deposition of the vanadium oxide thin films (VOx) was studied. Atomic-force microscopy (AFM) analysis results revealed that the structural features of VOx thin films strongly depend on the substrate temperature. Analysis of square resistance and its temperature dependence demonstrated that the difference of morphology introduced by substrate temperature plays an important role on the electrical properties of the films. The width of the thermal resistance hysteresis loop was also observed varied with the substrate temperature.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiongbang Wei, Zhiming Wu, Tao Wang, Xiangdong Xu, Jingjing Tang, and Yadong Jiang "Influence of substrate temperature on the morphology and thermal resistance of vanadium oxide thin films", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842K (11 March 2008); https://doi.org/10.1117/12.792154
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KEYWORDS
Thin films

Resistance

Temperature metrology

Sputter deposition

Vanadium

Oxides

Atomic force microscopy

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