A Simple, Very High Sensitivity Method For Measurement Of Ti Films For Integrated Optics Applications In Linb0[sub]3[/sub]

C. De Bernardi; M. Meliga; G. Meneghini; S. Morasca

doi:10.1117/12.937151

10 March 1987 A Simple, Very High Sensitivity Method For Measurement Of Ti Films For Integrated Optics Applications In Linb0₃

C. De Bernardi, M. Meliga, G. Meneghini, S. Morasca

Author Affiliations +

Proceedings Volume 0704, Integrated Optical Circuit Engineering IV; (1987) https://doi.org/10.1117/12.937151
Event: Cambridge Symposium-Fiber/LASE '86, 1986, Cambridge, MA, United States

Abstract

This paper presents an experimental investigation on the characteristics and the capabilities of optical densitometry as a low cost, easy and non destructive technique to measure Ti film thickness. Optical density yields a sensitivity and a resolution equal or better than 3 Å and can be absolutely calibrated for the total metal content at given deposition conditions.

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C. De Bernardi, M. Meliga, G. Meneghini, and S. Morasca "A Simple, Very High Sensitivity Method For Measurement Of Ti Films For Integrated Optics Applications In Linb0₃", Proc. SPIE 0704, Integrated Optical Circuit Engineering IV, (10 March 1987); https://doi.org/10.1117/12.937151

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