Laser-damage-resistant photoalignment layers for high-peak-power liquid crystal device applications

K. L. Marshall; J. Gan; G. Mitchell; S. Papernov; A. L. Rigatti; A. W. Schmid; S. D. Jacobs

doi:10.1117/12.795153

27 August 2008 Laser-damage-resistant photoalignment layers for high-peak-power liquid crystal device applications

K. L. Marshall, J. Gan, G. Mitchell, S. Papernov, A. L. Rigatti, A. W. Schmid, S. D. Jacobs

Proceedings Volume 7050, Liquid Crystals XII; 70500L (2008) https://doi.org/10.1117/12.795153
Event: Photonic Devices + Applications, 2008, San Diego, California, United States

Abstract

Large-aperture liquid crystal (LC) devices have been in continuous use since 1995 as polarization control devices in the 40-TW, 351-nm, 60-beam OMEGA Nd:glass laser system at the University of Rochester's Laboratory for Laser Energetics. The feasibility of using a noncontacting alignment method for high-peak-power LC laser optics by irradiation of a linearly photopolymerizable polymer with polarized UV light was recently investigated. These materials were found to have surprisingly large laser-damage thresholds at 1054 nm, approaching that of bare fused silica (30 to 60 J/cm²). Their remarkable laser-damage resistance and ease in scalability to large apertures of these photoalignment materials, along with the ability to produce multiple alignment states by photolithographic patterning, opens new doorways for their application in LC devices for optics, photonics, and high-peak-power laser applications.

Citation Download Citation

K. L. Marshall, J. Gan, G. Mitchell, S. Papernov, A. L. Rigatti, A. W. Schmid, and S. D. Jacobs "Laser-damage-resistant photoalignment layers for high-peak-power liquid crystal device applications", Proc. SPIE 7050, Liquid Crystals XII, 70500L (27 August 2008); https://doi.org/10.1117/12.795153

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