Acid diffusion length dependency for 32-nm node attenuated and chromeless phase shift mask

Jee-Hye You; Young-Min Kang; Minhee Jung; Hye-Keun Oh

doi:10.1117/12.804611

4 December 2008 Acid diffusion length dependency for 32-nm node attenuated and chromeless phase shift mask

Jee-Hye You, Young-Min Kang, Minhee Jung, Hye-Keun Oh

Proceedings Volume 7140, Lithography Asia 2008; 71403U (2008) https://doi.org/10.1117/12.804611
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

We applied the immersion lithography to get 32 nm node pattern with 1.55 NA, without using double exposure / double patterning. A chromeless phase shift mask is compared with an attenuated phase shift mask to make 32 nm dense 1:1 line and space pattern. We compared the aerial image, normalized image log slope, exposure latitude, and depth of focus for each mask type in order to see the effect of the post exposure bake and acid diffusion length. The process window shrinks fast if the diffusion length is larger than 10 nm for both mask types. However, up to 20 nm diffusion length, 32 nm can be processible if the exposure latitude of 5% is used in production.

Citation Download Citation

Jee-Hye You, Young-Min Kang, Minhee Jung, and Hye-Keun Oh "Acid diffusion length dependency for 32-nm node attenuated and chromeless phase shift mask", Proc. SPIE 7140, Lithography Asia 2008, 71403U (4 December 2008); https://doi.org/10.1117/12.804611

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available