Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA

Shi-Jei Chang; Charlie Chung-Ping Chen; Lawrence S. Melvin III

doi:10.1117/12.837686

14 December 2009 Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA

Shi-Jei Chang, Charlie Chung-Ping Chen, Lawrence S. Melvin III

Proceedings Volume 7520, Lithography Asia 2009; 75202G (2009) https://doi.org/10.1117/12.837686
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

Simultaneous source and mask optimization (SMO) has been shown to be an effective method to improve the quality of microlithography aerial imaging. However, the increasing computational complexity is also serious given that current optical proximity correction (OPC) runtime has already been very long. In this paper, we show that SMO can be done efficiently in our previous proposed Abbe-PCA method framework. Different from the Hopkins method, Abbe-PCA directly perform eigen-decomposition on the Abbe sources. In this framework, source modification is easy and efficient. Experimental results show that more than 10X runtime improvement is observed.

Citation Download Citation

Shi-Jei Chang, Charlie Chung-Ping Chen, and Lawrence S. Melvin III "Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA", Proc. SPIE 7520, Lithography Asia 2009, 75202G (14 December 2009); https://doi.org/10.1117/12.837686

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