Present status of laser-produced plasma EUV light source

Hitoshi Nagano; Tamotsu Abe; Shinji Nagai; Masaki Nakano; Yoshihiko Akanuma; Shin Nakajima; Kouji Kakizaki; Akira Sumitani; Junichi Fujimoto; Hakaru Mizoguchi

doi:10.1117/12.846273

22 March 2010 Present status of laser-produced plasma EUV light source

Hitoshi Nagano, Tamotsu Abe, Shinji Nagai, Masaki Nakano, Yoshihiko Akanuma, Shin Nakajima, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76363C (2010) https://doi.org/10.1117/12.846273
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The development status of key technologies for a HVM laser-produced plasma EUV light source is presented. This includes the high-power RF-excited CO₂ laser, the Sn droplet target and the collector mirror lifetime enhancement technology. In this paper, we mainly discuss countermeasures for Sn ions and neutrals which cause mirror reflectivity degradation. The effectiveness of ion mitigation by a strong magnetic field was measured. We also observed that Sn neutrals were removed by etching gases and that the etching process did not degrade the effectiveness of the ion mitigation by the magnetic field. A part of this work was supported by the New Energy and Industrial Technology Development Organization (NEDO), Japan.

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Hitoshi Nagano, Tamotsu Abe, Shinji Nagai, Masaki Nakano, Yoshihiko Akanuma, Shin Nakajima, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, and Hakaru Mizoguchi "Present status of laser-produced plasma EUV light source", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76363C (22 March 2010); https://doi.org/10.1117/12.846273

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