Optimization on illumination source with design of experiments

Helen Hu; Yi Zou; Yunfei Deng

doi:10.1117/12.848876

10 March 2010 Optimization on illumination source with design of experiments

Helen Hu, Yi Zou, Yunfei Deng

Author Affiliations +

Proceedings Volume 7640, Optical Microlithography XXIII; 764027 (2010) https://doi.org/10.1117/12.848876
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In advanced photolithography process for manufacturing integrated circuits, the critical pattern sizes that need to be printed on wafer are much smaller than the wavelength. Thus, source optimization (SO) techniques play a critical role in enabling a successful technology node. However, finding an appropriate illumination configuration involves intensive computation simulations. EDA vendors have been developing the pixelated source optimization tools that co-optimize both source and mask for a set of patterns. As an alternative approach, we have introduced design of experiments (DOE) methodology for parameterized source optimization to minimize computation efforts while achieving comparable CDU control for given design patterns. In this paper, we present a Response Surface Methodology (RSM) that simplifies the response function and achieves the optimization goal on multiple responses. Results have shown that the optimal input settings identified by this approach are comparable with the pixelated source optimization results.

Citation Download Citation

Helen Hu, Yi Zou, and Yunfei Deng "Optimization on illumination source with design of experiments", Proc. SPIE 7640, Optical Microlithography XXIII, 764027 (10 March 2010); https://doi.org/10.1117/12.848876

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