Use Of Expert Systems In Photolithography

Wendy Fong; Terry B. Cline

doi:10.1117/12.940438

17 April 1987 Use Of Expert Systems In Photolithography

Wendy Fong, Terry B. Cline

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940438
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Expert systems for photolithography or photolithography-related domains are being built by many semiconductor chip manufacturers, fabrication equipment manufacturers, and university groups. This paper describes several such applications for process control, diagnosis, automation, design, simulation, planning, and scheduling. Benefits and implementation issues are highlighted.

Citation Download Citation

Wendy Fong and Terry B. Cline "Use Of Expert Systems In Photolithography", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940438

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