Paper
7 September 2010 A dynamic approach to monitoring particle fallout in a cleanroom environment
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Abstract
Previous studies have correlated the particle fallout rates within cleanrooms to MIL-STD-1246 cleanliness levels. Unfortunately "cleanliness levels" are not linear and do not lead to easily understood increases with respect to either cleanroom class or time. Additionally, cleanroom "class" is rarely static but varies throughout the processing flow in accordance with the activity levels. A numerical evaluation of the particle fallout normalized to area coverage demonstrates a correlation that is directly proportional to both cleanroom class and exposure time, yielding a simple Class-Hour formulation. Application of this formulation allows for dynamic monitoring of the projected fallout rates using a standard air particle counter. The theoretical results compare favorably with historical data and recent studies.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Radford L. Perry III "A dynamic approach to monitoring particle fallout in a cleanroom environment", Proc. SPIE 7794, Optical System Contamination: Effects, Measurements, and Control 2010, 77940K (7 September 2010); https://doi.org/10.1117/12.861025
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KEYWORDS
Particles

Environmental monitoring

Autoregressive models

Contamination

Fourier transforms

Semiconducting wafers

Classification systems

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