IntenCD and mask phase uniformity

Yaron Cohen; Shmoolik Mangan; Shay Attal; Michael Ben-Yishay; Ilan Englard

doi:10.1117/12.864362

29 November 2010 IntenCD and mask phase uniformity

Yaron Cohen, Shmoolik Mangan, Shay Attal, Michael Ben-Yishay, Ilan Englard

Proceedings Volume 7823, Photomask Technology 2010; 78233I (2010) https://doi.org/10.1117/12.864362
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

The allowable wafer Critical Dimension Uniformity (CDU) budget of the 2x node poses stringent requirements on mask induced errors at wafer level. The total CDU budget of 2 nm which is partially consumed by across wafer and field process and imaging variations, leaves little room for additional mask errors to still comply to the overall CDU budget. The trend of higher mask error enhancement factor (MEEF) for advanced technology nodes aggravates this situation further. Traditionally, the assessment of these variations is based on separate critical dimension and phase/transmission measurements. Metrology measurement tools are typically based on different techniques to independently measure each source of non-uniformity and produce the required uniformity maps. Each technique concentrates on a single physical property (e.g., line-width, phase, transmission, etc.) and requires special calibration for the required accuracy, precision and its transformation from mask to the wafer nanometer domain. An alternative to all these separate measurements is proposed by using the IntenCD^TM application based on the aerial image of the mask. This alternative approach provides a map of mask-induced, printed CD variations across the photomask. In this paper, a study is presented to estimate mask-induced printed CDU at wafer level from the aerial image and results are compared to mask- and phase-CD measurements. The work shows that a single aerial IntenCD map can replace the two sets of data based on mask-CD and mask-phase measurements and allows for prediction of the mask contribution to overall printed CDU.

Citation Download Citation

Yaron Cohen, Shmoolik Mangan, Shay Attal, Michael Ben-Yishay, and Ilan Englard "IntenCD and mask phase uniformity", Proc. SPIE 7823, Photomask Technology 2010, 78233I (29 November 2010); https://doi.org/10.1117/12.864362

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Scanning electron microscopy

Semiconducting wafers

Reticles

Critical dimension metrology

Phase measurement

Data modeling

Show All Keywords

Keywords/Phrases

Search In:

Publication Years