SU-8 focus control mirrors released by XeF2 dry etch

Sarah J. Lukes; David L. Dickensheets

doi:10.1117/12.877077

14 February 2011 SU-8 focus control mirrors released by XeF₂ dry etch

Proceedings Volume 7930, MOEMS and Miniaturized Systems X; 793006 (2011) https://doi.org/10.1117/12.877077
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States

Abstract

SU8-2002 deformable membrane mirrors for primary focus control and compensation of focus-induced spherical aberration have been fabricated using a surface micromachining process with dry etching of silicon in XeF₂. This process has a higher yield and realizes larger mirrors with a twofold improvement in stroke, relative to a wet release etch process previously described. The use of 3 mm x 4.24 mm elliptical mirrors for 45° incidence focus control in microscopy is described.

Citation Download Citation

Sarah J. Lukes and David L. Dickensheets "SU-8 focus control mirrors released by XeF₂ dry etch", Proc. SPIE 7930, MOEMS and Miniaturized Systems X, 793006 (14 February 2011); https://doi.org/10.1117/12.877077

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