Paper
7 February 2011 Optimization of half-tone technology for diffractive microlens fabrication
V. P. Korolkov, R. K. Nasyrov, A. R. Sametov, S. A. Suhih
Author Affiliations +
Abstract
A new approach for the optimization of diffractive microlenses fabrication is presented. The problem is that fabrication process brings errors in profile formation. These errors decrease diffractive efficiency and wavefront quality. However, microlens quality can be increased by optimization of the fabrication process that takes into account transfer functions of technological equipment. We have applied this method for half-tone technology. Calibration samples were fabricated and transfer function was experimentally measured. Then initial half-tone mask was corrected and microlenses with higher quality were produced.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
V. P. Korolkov, R. K. Nasyrov, A. R. Sametov, and S. A. Suhih "Optimization of half-tone technology for diffractive microlens fabrication", Proc. SPIE 7957, Practical Holography XXV: Materials and Applications, 795710 (7 February 2011); https://doi.org/10.1117/12.874432
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Cited by 1 scholarly publication.
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KEYWORDS
Microlens

Photoresist materials

Multiphoton lithography

Diffractive optical elements

Projection systems

Modulation

Convolution

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