The application of DOE in uniform illumination for large area digital speckle pattern interferometry

Zhanhua Huang; Meng You; Huaiyu Cai; Meng Zhu

doi:10.1117/12.903997

28 November 2011 The application of DOE in uniform illumination for large area digital speckle pattern interferometry

Zhanhua Huang, Meng You, Huaiyu Cai, Meng Zhu

Proceedings Volume 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology; 820209 (2011) https://doi.org/10.1117/12.903997
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China

Abstract

Uniform illumination plays an important role in Digital Speckle Pattern Interferometry (DSPI) of measuring a large object. This paper presents a method that by designing a specified DOE with certain algorithm in front of laser diodes, a large and uniform illumination could be achieved at the designed distance. The fluctuation of no more than 10% has been analyzed for its influence on interferogram. Only 6 semiconductor lasers are necessary in the interferometer to lighting its view in theory and the experiment with the simulated illumination has been done. The fringes of deformation at different parts of the object show that this method is suitable for large area detection.

Citation Download Citation

Zhanhua Huang, Meng You, Huaiyu Cai, and Meng Zhu "The application of DOE in uniform illumination for large area digital speckle pattern interferometry", Proc. SPIE 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology, 820209 (28 November 2011); https://doi.org/10.1117/12.903997

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KEYWORDS

Diffractive optical elements

Speckle

Speckle pattern

Interferometry

Semiconductor lasers

Gaussian beams

Algorithm development

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