Paper
2 February 1988 Invited Paper Models For Microstructure Evolution During Optical Thin Film Growth
K. H. Muller
Author Affiliations +
Abstract
In this study several recently developed theoretical models will be reported which help to understand some of the fundamental processes which occur at an atomic level during thin film growth. A simple stochastic lattice-gas model has been employed to reveal substrate temperature effects on columnar microstructure. Molecular-dynamics studies have been performed in order to elucidate the adatom-surface interaction and to simulate vapor, sputter and ion-assisted deposition. A collision cascade model for ion-assisted optical films has also been used and explains quantitatively the experimentally observed densification of optical films.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. H. Muller "Invited Paper Models For Microstructure Evolution During Optical Thin Film Growth", Proc. SPIE 0821, Modeling of Optical Thin Films, (2 February 1988); https://doi.org/10.1117/12.941840
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Cited by 3 scholarly publications.
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KEYWORDS
Ions

Chemical species

Argon

Thin films

Crystals

Sputter deposition

Diffusion

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