Paper
24 October 2012 1.55μm laterally coupled ridge-waveguide DFB lasers with third-order surface grating
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Proceedings Volume 8412, Photonics North 2012; 84121R (2012) https://doi.org/10.1117/12.2001459
Event: Photonics North 2012, 2012, Montréal, Canada
Abstract
Laterally-coupled distributed feedback (LC-DFB) lasers offer compelling advantages over standard DFB lasers. The use of surface grating on the ridge waveguide sidewalls in LC-DFB devices avoids any epitaxial overgrowth. This provides a considerable simplification in the fabrication process, reducing cost and time of manufacturing, and ultimately increasing yield. It offers also the potential for monolithic integration with other devices; paving the way towards low-cost and mass-production of photonics integrated circuits. In this work, we report on the realization of high-order grating InGaAsP/InP multiple-quantum-well (MQW) LC-DFB lasers at 1.55 μm by means of stepper lithography and inductively-coupled reactive-ion as well as wet chemical etching. Third-order rectangular-shaped grating has been lithographically defined on the ridge waveguide sidewalls with a relatively deep etching along the laser cavity. The preliminary experimental characterization shows interesting results for as-cleaved devices tested in room temperature under CW operation. A fabricated 1500 μm-long cavity LC-DFB laser shows stable single-mode operation with a side mode suppression ratio as high as 50 dB. The tested device can emit at power as high as 9 mW, and the measured threshold current is around 80 mA at room temperature. Moreover, the measured linewidth has been found to be as narrow as 178 kHz using the delayed self-heterodyne interferometric technique.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kais Dridi, Abdessamad Benhsaien, Jessica Zhang, and Trevor Hall "1.55μm laterally coupled ridge-waveguide DFB lasers with third-order surface grating", Proc. SPIE 8412, Photonics North 2012, 84121R (24 October 2012); https://doi.org/10.1117/12.2001459
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KEYWORDS
Etching

Waveguides

Photonic integrated circuits

Lithography

Cladding

Continuous wave operation

Photomasks

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