Paper
15 October 2012 Analyzing of mid-frequency-errors from optical manufacture
Guo Wen, Xiao-hui Meng, Yong-gang Wang, Ling-di Xu
Author Affiliations +
Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84172N (2012) https://doi.org/10.1117/12.977855
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
The mechanism of mid-frequency errors in optical fabrication is introduced. Based on R-C model, the effect of primary mirror with mid-frequency errors to system performance was analyzed. Its, Then, Power Spectral Density (PSD) and Zernike polynomial are discussed in the assessment of optical surface errors. Combining with given samples, the merit and demerit of obtained from Zernike polynomial and PSD were indicated: Zernike polynomial can do well in the assessment of low-frequency errors, but it would smooth mid-frequency errors and cannot figure out the value of the mid-frequency errors contained ; PSD not only figure out the value of mid-frequency errors contained, but also reveal the relation of spatial frequency and wavefront errors.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guo Wen, Xiao-hui Meng, Yong-gang Wang, and Ling-di Xu "Analyzing of mid-frequency-errors from optical manufacture", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172N (15 October 2012); https://doi.org/10.1117/12.977855
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KEYWORDS
Error analysis

Modulation

Optics manufacturing

Zernike polynomials

Mirrors

Modulation transfer functions

Wavefronts

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