Paper
26 March 2013 Large-scale dynamics of directed self-assembly defects on chemically pre-patterned surface
Kenji Yoshimoto, Takashi Taniguchi
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Abstract
Morphological defects of block copolymers are dynamically formed during the annealing step of directed self­ assembly (DSA) process. Understanding the dynamics of such defects is crucial to manufacture defect-free wafers, however it is not well-understood due to difficulties in in-situ measurements. In order to provide some insights into this problem, we have performed dynamic simulations of symmetric diblock copolymers on chemically pre-patterned surface. A simplified model, so-called the Ohta-Kawasaki (OK) model was employed in this study, whose free energy and chemical potential were expressed as a function of the local order parameters. Time evolution of the local order parameters were calculated numerically and iteratively from the equation of continuity. As a test case, the two-dimensional (2D) dynamic simulations were performed including thermal fluctuations. The time evolution of the lamella defects was successfully characterized as a function of the interactive strength between the diblock copolymers and the chemically pre-patterned surface. In the three­ dimensional (3D) dynamic simulations, some complicated morphologies formed on the chemically pre-patterned surface were found to be similar to those obtained from Monte Carlo simulations. Our preliminary simulation data prove that for small χNs, dynamic simulations of diblock copolymers with OK model could be a powerful method to predict DSA defects with reasonable accuracy and with small computational cost.
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Kenji Yoshimoto and Takashi Taniguchi "Large-scale dynamics of directed self-assembly defects on chemically pre-patterned surface", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801I (26 March 2013); https://doi.org/10.1117/12.2011826
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Cited by 15 scholarly publications and 1 patent.
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KEYWORDS
Monte Carlo methods

Computer simulations

Directed self assembly

3D modeling

Annealing

Data modeling

Line edge roughness

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