Scanner effects on directed self-assembly patterning

Stephen P. Renwick

doi:10.1117/12.2046567

28 March 2014 Scanner effects on directed self-assembly patterning

Stephen P. Renwick

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90492I (2014) https://doi.org/10.1117/12.2046567
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Directed self-assembly (DSA) of various polymers is a potential next-generation lithography component. Lithographers can use an ArF scanner to print guide structures with pitches accessible with current technology. The DSA materials, in a non-exposure step, perform pitch multiplication of 1-D and 2-D guide structures. While research has investigated defects inherent to the DSA material, ArF scanner effects have received little attention. This work uses DSA models and scanner models to assess requirements for ArF immersion scanners for DSA complimentary lithography.

Citation Download Citation

Stephen P. Renwick "Scanner effects on directed self-assembly patterning", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90492I (28 March 2014); https://doi.org/10.1117/12.2046567

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