New materials for directed self-assembly for advanced patterning

Jieqian Zhang; Janet Wu; Mingqi Li; Valeriy V. Ginzburg; Jeffrey D. Weinhold; Michael B. Clark; Peter Trefonas III; Phillip D. Hustad

doi:10.1117/12.2046328

27 March 2014 New materials for directed self-assembly for advanced patterning

Jieqian Zhang, Janet Wu, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold, Michael B. Clark, Peter Trefonas III, Phillip D. Hustad

Author Affiliations +

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 905111 (2014) https://doi.org/10.1117/12.2046328
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Directed Self-Assembly (DSA) of block copolymers is a candidate advanced patterning technology at future technology nodes. Although DSA promises resolution and cost benefits, a number of constraints and challenges remain for its implementation. Poly(styrene-block-methyl methacrylate) (PS-b-PMMA) has been widely studied in DSA and applied in various applications to demonstrate the potential of DSA to extend optical lithography, including line space and contact hole patterning and uniformity repair,. However, the relatively weak segregation strength of PS-b-PMMA limits its capability to pattern sub-10 nm features. This paper presents the use of strongly segregated high X block copolymers to enable sub-10 nm patterning. Chemoepitaxy DSA with high X lamellar block copolymers is demonstrated with two different strategies based on thermal annealing process and no top coat. These technologies hold promise to enable the implementation of DSA at future technology nodes.

Citation Download Citation

Jieqian Zhang, Janet Wu, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold, Michael B. Clark, Peter Trefonas III, and Phillip D. Hustad "New materials for directed self-assembly for advanced patterning", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905111 (27 March 2014); https://doi.org/10.1117/12.2046328

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE