Exposure Dose Control Techniques For Excimer Laser Lithography

David H. Tracy; Fred Y. Wu

doi:10.1117/12.968442

1 January 1988 Exposure Dose Control Techniques For Excimer Laser Lithography

David H. Tracy, Fred Y. Wu

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968442
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Measurements of pulse-to-pulse energy fluctuation statistics were made at several wave-lengths for a commercial discharge pumped excimer laser, under a variety of operating conditions. Various approaches to achieving accurate exposure dose control in microlithographic exposure tools using noisy pulsed sources are discussed. A pulse-by-pulse active control technique for static field lithography is described in detail, together with measured performance data. Alternative techniques suitable for one dimensional scanning slit field exposure tools are presented.

Citation Download Citation

David H. Tracy and Fred Y. Wu "Exposure Dose Control Techniques For Excimer Laser Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968442

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