Subhalfmicronic Contact Printing Lithography Using A Microwave Powered Deep UV Source

Andre P. Weill; Jean-Marc Francou; Jean-Pierre Panabiere

doi:10.1117/12.968419

1 January 1988 Subhalfmicronic Contact Printing Lithography Using A Microwave Powered Deep UV Source

Andre P. Weill, Jean-Marc Francou, Jean-Pierre Panabiere

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968419
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Microwave energized bulbs are deep UV sources, which are well suited to applications requiring high light intensities of within the 200-260 nm wavelength range. This deep UV source has to date only been used either for transferring the photoresist patterns from the imaging layer to the planarizing layer of a PCM bilevel structure, or for photostabilizing the patterns delineated in a novolac based photoresist. So far, nobody has made use of the inherent resolution capability of the microwave powered deep UV light beam. The subhalfmicronic lithographic process described in this paper associates the resolution capability of the FUSION ILLUMINATOR 100 system with the contact performances of a K. SUSS mask aligner. Vacuum contact printing reaches the 0.3-0.5 )m resolution range for exposure times reduced to less than one minute. This paper presents and discusses results obtained by vacuum contact printing over W or Si02 layers.

Citation Download Citation

Andre P. Weill, Jean-Marc Francou, and Jean-Pierre Panabiere "Subhalfmicronic Contact Printing Lithography Using A Microwave Powered Deep UV Source", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968419

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