Recent progress of negative-tone imaging with EUV exposure

Toru Fujimori; Toru Tsuchihashi; Toshiro Itani

doi:10.1117/12.2085706

20 March 2015 Recent progress of negative-tone imaging with EUV exposure

Toru Fujimori, Toru Tsuchihashi, Toshiro Itani

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 942505 (2015) https://doi.org/10.1117/12.2085706
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

This study describes the recent progress of negative-tone imaging with EUV exposure (EUV-NTI) compared with positive-tone development (PTD). NTI uses organic solvent-based developer to provide low swelling and smooth-dissolving behavior. Therefore, EUV-NTI is expected to offer several advantages in terms of performance, especially for improving line-width roughness (LWR), which is expected to resolve the resolution, LWR, and sensitivity (RLS) tradeoff. Herein, novel chemical amplified resist materials for EUV-NTI are investigated to improve LWR and sensitivity. Results indicate that the EUV-NTI has better performance than PTD, with ‘single digit mJ/cm²,while maintaining the LWR performance. Furthermore, EUV-NTI processing such as the pre-applied bake (PAB) temperature, post-exposure bake (PEB) temperature, development procedure, and rinse procedure are very effective for improving the lithographic performance. In addition, the lithographic performance with NXE3100 scanner is also reported.

Citation Download Citation

Toru Fujimori, Toru Tsuchihashi, and Toshiro Itani "Recent progress of negative-tone imaging with EUV exposure", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942505 (20 March 2015); https://doi.org/10.1117/12.2085706

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