Self-aligned quadruple patterning-compliant placement

Fumiharu Nakajima; Chikaaki Kodama; Koichi Nakayama; Shigeki Nojima; Toshiya Kotani

doi:10.1117/12.2085705

26 March 2015 Self-aligned quadruple patterning-compliant placement

Fumiharu Nakajima, Chikaaki Kodama, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani

Proceedings Volume 9427, Design-Process-Technology Co-optimization for Manufacturability IX; 942708 (2015) https://doi.org/10.1117/12.2085705
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Self-Aligned Quadruple Patterning (SAQP) will be one of the leading candidates for sub-14nm node and beyond. However, compared with triple patterning, making a feasible standard cell placement has following problems. (1) When coloring conflicts occur between two adjoining cells, they may not be solved easily since SAQP layout has stronger coloring constraints. (2) SAQP layout cannot use stitch to solve coloring conflict. In this paper, we present a framework of SAQP-aware standard cell placement considering the above problems. When standard cell is placed, the proposed method tries to solve coloring conflicts between two cells by exchanging two of three colors. If some conflicts remain between adjoining cells, dummy space will be inserted to keep coloring constraints of SAQP. We show some examples to confirm effectiveness of the proposed framework. To our best knowledge, this is the first framework of SAQP-aware standard cell placement.

Citation Download Citation

Fumiharu Nakajima, Chikaaki Kodama, Koichi Nakayama, Shigeki Nojima, and Toshiya Kotani "Self-aligned quadruple patterning-compliant placement", Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 942708 (26 March 2015); https://doi.org/10.1117/12.2085705

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