Spectroscopic imaging of buried layers in 2+1D via tabletop ptychography with high-harmonic EUV illumination

Dennis F. Gardner; Christina L. Porter; Elisabeth R. Shanblatt; Giulia F. Mancini; Robert Karl Jr.; Michael Tanksalvala; Charles Bevis; Henry C. Kapteyn; Margaret M. Murnane; Daniel E. Adams

doi:10.1117/12.2220368

21 April 2016 Spectroscopic imaging of buried layers in 2+1D via tabletop ptychography with high-harmonic EUV illumination

Dennis F. Gardner, Christina L. Porter, Elisabeth R. Shanblatt, Giulia F. Mancini, Robert Karl Jr., Michael Tanksalvala, Charles Bevis, Henry C. Kapteyn, Margaret M. Murnane, Daniel E. Adams

Author Affiliations +

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 97780J (2016) https://doi.org/10.1117/12.2220368
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

We use EUV coherent microscopy to obtain high-resolution images of buried interfaces, with chemical specificity, in 2+1 dimensions. We perform reflection mode, ptychographic, coherent diffractive imaging with tabletop EUV light, at 29nm, produced by high harmonic generation. Our damascene-style samples consist of copper structures inlaid in SiO₂, polished nearly flat with chemical mechanical polishing. We obtain images of both an unaltered damascene as well as one buried below a 100nm thick layer of evaporated aluminum. The aluminum is opaque to visible light and thick enough that neither optical microscopy, SEM, nor AFM can access the buried interface. EUV microscopy is able to image the buried structures, non-destructively, in conditions where other techniques cannot.

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Dennis F. Gardner, Christina L. Porter, Elisabeth R. Shanblatt, Giulia F. Mancini, Robert Karl Jr., Michael Tanksalvala, Charles Bevis, Henry C. Kapteyn, Margaret M. Murnane, and Daniel E. Adams "Spectroscopic imaging of buried layers in 2+1D via tabletop ptychography with high-harmonic EUV illumination", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780J (21 April 2016); https://doi.org/10.1117/12.2220368

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