High-order aberration control during exposure for leading-edge lithography projection optics

Yasuhiro Ohmura; Yosuke Tsuge; Toru Hirayama; Hironori Ikezawa; Daisuke Inoue; Yasuhiro Kitamura; Yukio Koizumi; Keisuke Hasegawa; Satoshi Ishiyama; Toshiharu Nakashima; Takahisa Kikuchi; Minoru Onda; Yohei Takase; Akimasa Nagahiro; Susumu Isago; Hidetaka Kawahara

doi:10.1117/12.2218840

15 March 2016 High-order aberration control during exposure for leading-edge lithography projection optics

Yasuhiro Ohmura, Yosuke Tsuge, Toru Hirayama, Hironori Ikezawa, Daisuke Inoue, Yasuhiro Kitamura, Yukio Koizumi, Keisuke Hasegawa, Satoshi Ishiyama, Toshiharu Nakashima, Takahisa Kikuchi, Minoru Onda, Yohei Takase, Akimasa Nagahiro, Susumu Isago, Hidetaka Kawahara

Author Affiliations +

Proceedings Volume 9780, Optical Microlithography XXIX; 97800Y (2016) https://doi.org/10.1117/12.2218840
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

High throughput with high resolution imaging has been key to the development of leading-edge microlithography. However, management of thermal aberrations due to lens heating during exposure has become critical for simultaneous achievement of high throughput and high resolution. Thermal aberrations cause CD drift and overlay error, and these errors lead directly to edge placement errors (EPE). Management and control of high order thermal aberrations is a critical requirement. In this paper, we will show practical performance of the lens heating with dipole and other typical illumination conditions for finer patterning. We confirm that our new control system can reduce the high-order aberrations and enable critical-dimension uniformity CDU during the exposure.

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Yasuhiro Ohmura, Yosuke Tsuge, Toru Hirayama, Hironori Ikezawa, Daisuke Inoue, Yasuhiro Kitamura, Yukio Koizumi, Keisuke Hasegawa, Satoshi Ishiyama, Toshiharu Nakashima, Takahisa Kikuchi, Minoru Onda, Yohei Takase, Akimasa Nagahiro, Susumu Isago, and Hidetaka Kawahara "High-order aberration control during exposure for leading-edge lithography projection optics", Proc. SPIE 9780, Optical Microlithography XXIX, 97800Y (15 March 2016); https://doi.org/10.1117/12.2218840

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