Paper
12 October 2016 Investigation of data retention under current bias for phase change memory
Yao-Yao Lu, Dao-Lin Cai, Yi-Feng Chen, Yue-Qing Wang, Hong-Yang Wei, Ru-Ru Huo, Zhi-Tang Song
Author Affiliations +
Proceedings Volume 9818, 2016 International Workshop on Information Data Storage and Tenth International Symposium on Optical Storage; 98180W (2016) https://doi.org/10.1117/12.2246987
Event: 2016 International Workshop on Information Data Storage and Tenth International Symposium on Optical Storage, 2016, Changzhou, China
Abstract
With Phase-change memory (PCM), information can be stored as different resistance states even when not powered. In order to accurately characterize the reliability of PCM devices, data retention has to be tested carefully. In this paper, a new test method is applied to measure the data retention of T-shaped PCM devices. This method makes it possible to accelerate crystallization in the amorphous area by using current bias. The new method works based on the field-induced crystallization theory, and could be able to gather fast and detailed information about high-resistance state’s failure process, and at the same time, it could avoid issues related to high temperature. Experimental data for T-shaped PCM devices based on Ge2Sb2Te5 are presented and analyzed. An exponential trend-line of failure time t versus reciprocal bias current 1/I shows only negligible deviation of the measured data points, enabling the extrapolation of the retention behavior for ten-year lifetime. A maximum disturb current value of 5.08 μA is extracted to guarantee the ten years data retention requirement for PCM applications.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yao-Yao Lu, Dao-Lin Cai, Yi-Feng Chen, Yue-Qing Wang, Hong-Yang Wei, Ru-Ru Huo, and Zhi-Tang Song "Investigation of data retention under current bias for phase change memory", Proc. SPIE 9818, 2016 International Workshop on Information Data Storage and Tenth International Symposium on Optical Storage, 98180W (12 October 2016); https://doi.org/10.1117/12.2246987
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KEYWORDS
Crystals

Failure analysis

Resistance

Chalcogenides

Reliability

Digital signal processing

Metals

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