Investigation and modeling of CPL mask profiles using OCD

Hsuan-Chen Chen; Ren-Hao Lin; Chien-Cheng Chen; Cheng-Hsuan Huang; Ta-Cheng Lien; Chia-Jen Chen; Gaston Lee; Hsin-Chang Lee; Anthony Yen

doi:10.1117/12.2245332

10 May 2016 Investigation and modeling of CPL mask profiles using OCD

Hsuan-Chen Chen, Ren-Hao Lin, Chien-Cheng Chen, Cheng-Hsuan Huang, Ta-Cheng Lien, Chia-Jen Chen, Gaston Lee, Hsin-Chang Lee, Anthony Yen

Author Affiliations +

Proceedings Volume 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 998408 (2016) https://doi.org/10.1117/12.2245332
Event: Photomask Japan 2016, 2016, Yokohama, Japan

Abstract

Mask profile of chromeless phase-shifting lithography (CPL) defined by OCD has been investigated. In CPL masks, unbalanced bombardments caused by different ion accelerations lead to the formation of micro-notch structures. A better understanding of micro-notch structures is essential for quality gating of mask processes to improve of CPL mask profiles. By measuring 12 of 16 elements of Mueller matrix, we are able to set up a model to simulate the depth of micro-notch structure profile which shows good correlation with TEM images. Moreover, values of CD, quartz etching depth and side wall angle acquired by OCD are presented and compared with those obtained by SEM, TEM and AFM, respectively.

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Hsuan-Chen Chen, Ren-Hao Lin, Chien-Cheng Chen, Cheng-Hsuan Huang, Ta-Cheng Lien, Chia-Jen Chen, Gaston Lee, Hsin-Chang Lee, and Anthony Yen "Investigation and modeling of CPL mask profiles using OCD", Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 998408 (10 May 2016); https://doi.org/10.1117/12.2245332

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