Does lithography still matter after high NA EUV?

H.-S. Philip Wong

doi:10.1117/12.2606653

9 June 2022 Does lithography still matter after high NA EUV?

H.-S. Philip Wong

Proceedings Volume PC12053, Metrology, Inspection, and Process Control XXXVI; PC1205302 (2022) https://doi.org/10.1117/12.2606653
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

The semiconductor industry has been extremely successful in integrating discrete components into billion-transistor chips. Future electronic systems will continue to rely on, and increasingly benefit from, the advances in semiconductor technology as they have had for more than five decades. Applications such as AI, machine learning, 5G, and even quantum computing, will not fulfill their promises without the continual advancements of semiconductor technology that is anticipated. Advancement of lithography has always been viewed as one of the most important, if not the most important, technologies that enables generations after generations of semiconductor technologies. With EUV and the upcoming high NA tools, it appears that there will be enough patterning resolution to pattern anything we want, unless we need to carve individual atoms. What is the future of lithography? What problems can lithography solve for the semiconductor industry? I will present industry and technology trends as a seed corn for discussion.

Conference Presentation

Citation Download Citation

H.-S. Philip Wong "Does lithography still matter after high NA EUV?", Proc. SPIE PC12053, Metrology, Inspection, and Process Control XXXVI, PC1205302 (9 June 2022); https://doi.org/10.1117/12.2606653

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