SCREEN's DT-3000 track-booster system: how can hardware improve EUV performance?

Andreia Santos; Yuji Tanaka; Masaya Asai; Masahiko Harumoto; Wesley Zanders; Jelle Vandereyken; Lander Verstraete; Ashish Rathore; Hyo Seon Suh

doi:10.1117/12.2643150

31 October 2022 SCREEN's DT-3000 track-booster system: how can hardware improve EUV performance?

Andreia Santos, Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Wesley Zanders, Jelle Vandereyken, Lander Verstraete, Ashish Rathore, Hyo Seon Suh

Author Affiliations +

Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920W (2022) https://doi.org/10.1117/12.2643150
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Conference Poster

There is no online version at this time. The PDF is only available to people who have bought the paper or have a subscription.

Citation Download Citation

Andreia Santos, Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Wesley Zanders, Jelle Vandereyken, Lander Verstraete, Ashish Rathore, and Hyo Seon Suh "SCREEN's DT-3000 track-booster system: how can hardware improve EUV performance?", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920W (31 October 2022); https://doi.org/10.1117/12.2643150

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available