Photolithography equipment market and technology: state and challenges

Taguhi Yeghoyan

doi:10.1117/12.2664881

30 April 2023 Photolithography equipment market and technology: state and challenges

Taguhi Yeghoyan

Proceedings Volume PC12494, Optical and EUV Nanolithography XXXVI; PC1249409 (2023) https://doi.org/10.1117/12.2664881
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Photolithography equipment is the enabler of semiconductor device development. While i-line and DUV equipment replaces Mask Aligners to satisfy the overall miniaturization of More-than-Moore components (Power, RF, MEMS..), Advanced Packaging (AP) elaboration is tormented by multitude of challenges. Indeed, packaging is the limitation to performance of components manufactured with EUV lithography. Hence, AP architectures are flourishing, for which Laser Direct Imaging as well as i-line and DUV patterning are used. In this exciting time, we study photolithography equipment market, ecosystem and technology trends looking in detail into the forecast, market share, supply chain and auxiliary to patterning processes and equipment.

Conference Presentation

Citation Download Citation

Taguhi Yeghoyan "Photolithography equipment market and technology: state and challenges", Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC1249409 (30 April 2023); https://doi.org/10.1117/12.2664881

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