Errata: Optimization of laser machining process for the preparation of photomasks, and its application to microsystems fabrication

Avinash Kumar; Ankur Gupta; Rishi Kant; Akhhtar Syed Nadeem; Nachiketa Tiwari; Janakrajan Ramkumar; Shantanu Bhattacharya

doi:10.1117/1.JMM.13.1.019801

21 January 2014 Errata: Optimization of laser machining process for the preparation of photomasks, and its application to microsystems fabrication

Avinash Kumar, Ankur Gupta, Rishi Kant, Akhhtar Syed Nadeem, Nachiketa Tiwari, Janakrajan Ramkumar, Shantanu Bhattacharya

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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 1, 019801 (January 2014). https://doi.org/10.1117/1.JMM.13.1.019801

Abstract

This article [J. Micro/Nanolith. MEMS MOEMS. , 12, (4 ), 041203 (2013)] was originally published online on 25 September 2013 with errors in Figure 6. The figure sequence in the caption did not match the sequence given in the figure. Also, Fig. 6(d) showed an image of aluminum mask with a crossbar on the image which is not visible and an improper scale with a typographical error. The corrected figure and caption appear below. Online versions were corrected on 08 January 2014.

© The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Avinash Kumar, Ankur Gupta, Rishi Kant, Akhhtar Syed Nadeem, Nachiketa Tiwari, Janakrajan Ramkumar, and Shantanu Bhattacharya "Errata: Optimization of laser machining process for the preparation of photomasks, and its application to microsystems fabrication," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(1), 019801 (21 January 2014). https://doi.org/10.1117/1.JMM.13.1.019801

Published: 21 January 2014

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