Abbe’s resolution formulas for a grating imaged under on-axis, off-axis, and incoherent illuminations are obtained with the help of the line-spread function. A rule-of-thumb relationship applicable to the extreme ultraviolet mask for patterning a grating near the resolution limit of the imaging optics is given. |
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CITATIONS
Cited by 2 scholarly publications.
Image resolution
Photomasks
Extreme ultraviolet
Refractive index
Imaging systems
Optical lithography
Point spread functions