Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features

K. V. Sreekanth; Vadakke Matham Murukeshan

doi:10.1117/1.3386680

1 April 2010 Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features

K. V. Sreekanth, Vadakke Matham Murukeshan

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 2, 023007 (April 2010). https://doi.org/10.1117/1.3386680

Abstract

A lithography technique for patterning one-dimensional (1-D) nanoscale grating features based on surface plasmon (SP) interference is demonstrated both experimentally and numerically. We report a cost-effective, single-exposure maskless plasmonic lithography to generate 156-nm periodic grating lines at an exposure wavelength of 364 nm.

©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

K. V. Sreekanth and Vadakke Matham Murukeshan "Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(2), 023007 (1 April 2010). https://doi.org/10.1117/1.3386680

Published: 1 April 2010

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