Symmetry measure and phase-matched filters in pattern recognition

Stephan Teiwes; Frank Wyrowski

doi:10.1117/12.179884

1 November 1994 Symmetry measure and phase-matched filters in pattern recognition

Stephan Teiwes, Frank Wyrowski

Author Affiliations +

Optical Engineering, Vol. 33, Issue 11, (November 1994). https://doi.org/10.1117/12.179884

Abstract

The use of the diffraction phenomenon in pattern recognition is a well-established area in optical information processing. Typically the generation of a correlation peak by suitable filters is used to recognize a pattern. We introduce a symmetry measure for pattern recognition. It can be used for a wide class of filters, which we call phase-matched filters. Encoding techniques of diffractive optics allow its implementation as amplitude- or phase-encoded filters.

Citation Download Citation

Stephan Teiwes and Frank Wyrowski "Symmetry measure and phase-matched filters in pattern recognition," Optical Engineering 33(11), (1 November 1994). https://doi.org/10.1117/12.179884

Published: 1 November 1994

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available