Andreas Ehlert, Michael Kerstan, Holger Lundt, Anton Huber, Dieter Helmreich, Hans-Dieter Geiler, Harald Karge, Matthias Wagner
Optical Engineering, Vol. 36, Issue 02, (February 1997) https://doi.org/10.1117/1.601216
TOPICS: Semiconducting wafers, Luminescence, Silicon, Heterodyning, Modulation, Reflectivity, Semiconductors, Surface finishing, Optical engineering, Polishing
Two noncontact laser-based heterodyne techniques, photothermal heterodyne (PTH) and photoluminescence heterodyne (PLH), are introduced and applied to processing and quality control in silicon wafer manufacturing. The crystallographic characteristics of processinduced defects in silicon wafers are suitable for the application of PTH and PLH techniques, which are demonstrated on selected examples from different steps of silicon wafer production. Both PLH and PTH techniques meet the demand for nondestructive and on-line-suitable measurement in the semiconductor industry.