Uniformity of image amplification by two-wave mixing in photorefractive crystals

Danyu Chen; Fengchun Tian; Youwen Hu; Ying Liu; Liang Han

doi:10.1117/1.OE.53.3.033106

21 March 2014 Uniformity of image amplification by two-wave mixing in photorefractive crystals

Danyu Chen, Fengchun Tian, Youwen Hu, Ying Liu, Liang Han

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Optical Engineering, Vol. 53, Issue 3, 033106 (March 2014). https://doi.org/10.1117/1.OE.53.3.033106

Abstract

A model of two-wave mixing in the photorefractive crystal, which takes account of the difference in spatial frequency in a beam, has been built to study the uniformity of image amplification. Based on the theoretical analysis of the model, the gain distribution for each pixel in the signal beam has been obtained. It shows that the unevenness of the gain is induced by the difference in spatial frequency in the beam. The factors that impact on the uniformity of image amplification have been analyzed. As an example, the effects of these factors in a given photorefractive crystal have been studied through simulation.

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Danyu Chen, Fengchun Tian, Youwen Hu, Ying Liu, and Liang Han "Uniformity of image amplification by two-wave mixing in photorefractive crystals," Optical Engineering 53(3), 033106 (21 March 2014). https://doi.org/10.1117/1.OE.53.3.033106

Published: 21 March 2014

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