Dr. Aiwen Wu Profile

Dr. Aiwen Wu

Sr. Applications Manager at Entegris Inc

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 1 May 2023 Poster + Paper

Metallic contamination reduction in polymer solution using membrane purification technology

Pranesh Muralidhar, Antonio Ramirez, Aiwen Wu, Lawrence Chen, Yamin Liu, Luxi Shen, Robert Blacksmith, Sabrina Wong, Matthew Melanson, Andrey Rudenko

Proceedings Volume 12498, 124981L (2023) https://doi.org/10.1117/12.2657698

KEYWORDS: Metals, Polymers, Tunable filters, Chromium, Contamination, Zinc, Photoresist materials, Iron, Calcium, Aluminum

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Proceedings Article | 25 May 2022 Poster + Paper

Removing metallic contaminants from photochemical solvents using advanced purification technologies

Kusum Maharjan, Iou-Sheng Ke, Sabrina Wong, Aiwen Wu, Ying Qi, James Hamzik, Lawrence Chen

Proceedings Volume 12055, 120550V (2022) https://doi.org/10.1117/12.2614308

KEYWORDS: Metals, Iron, Optical lithography, Zinc, Calcium, Sodium, Aluminum, Magnesium, Copper

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Proceedings Article | 22 February 2021 Poster + Paper

Optimization of point-of-use filtration for metal oxide photoresist

Aiwen Wu, Harvey Tang, Gregg Conner, Shu Hao Chang, Gaetano Giordano, Dominick Smiddy, Mark Geniza, Benjamin Clark

Proceedings Volume 11612, 116120X (2021) https://doi.org/10.1117/12.2583842

KEYWORDS: Oxides, Metals, Extreme ultraviolet, Photoresist materials, Semiconducting wafers, Extreme ultraviolet lithography, Particles, Manufacturing, Chemically amplified resists

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Proceedings Article | 23 March 2020 Paper

Improving EUV underlayer coating defectivity using Point-Of-Use filtration

Aiwen Wu, Hareen Bayana, Philippe Foubert, Andrea Chacko, Douglas Guererro

Proceedings Volume 11326, 113261Z (2020) https://doi.org/10.1117/12.2551647

KEYWORDS: Extreme ultraviolet, Coating, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Silicon, Photoresist materials, Thin film coatings, Thin films, Polymers

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Proceedings Article | 25 March 2019 Presentation + Paper

Expanding the lithographer's toolkit to reduce variability: filtration considerations

V. Goel, A. Wu, J. Braggin

Proceedings Volume 10960, 1096017 (2019) https://doi.org/10.1117/12.2514965

KEYWORDS: Particles, Chemistry, Lithography, Adsorption, Polymers

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Proceedings Article | 25 March 2019 Paper

A new tailored point-of-use filter to reduce immersion lithography downtime and defects

Aiwen Wu, Annie Xia, Hareen Bayana

Proceedings Volume 10960, 109601Y (2019) https://doi.org/10.1117/12.2514976

KEYWORDS: Particles, Metals, Optical lithography, Chemistry, Lithography, Immersion lithography, Manufacturing, Contamination

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Proceedings Article | 25 March 2019 Paper

An exploration of the use of fluoropolymers in photofiltration

A. Wu, A. Xia

Proceedings Volume 10960, 109601U (2019) https://doi.org/10.1117/12.2514958

KEYWORDS: Metals, Lithography, Chemistry, Optical lithography

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Proceedings Article | 13 March 2018 Paper

The intrinsic role of membrane morphology to reduce defectivity in advanced photochemicals

Tetsu Kohyama, Aiwen Wu, Kozue Miura, Yasushi Ohyashiki

Proceedings Volume 10586, 1058617 (2018) https://doi.org/10.1117/12.2297389

KEYWORDS: Polymers, Yield improvement, Lithography, Manufacturing, Semiconducting wafers, Industrial chemicals, Chromatography

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Proceedings Article | 13 March 2018 Paper

Targeted removal of metallic contamination from lithography solvents using membrane purifiers

Aiwen Wu, Tetsu Kohyama, James Hamzik, Saksatha Ly, Jad Jaber

Proceedings Volume 10586, 1058618 (2018) https://doi.org/10.1117/12.2297395

KEYWORDS: Metals, Ions, Lithography, Contamination, Adsorption, Photoresist materials, Semiconducting wafers

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Proceedings Article | 27 March 2017 Paper

Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration

Lucia D'Urzo, Hareen Bayana, Jelle Vandereyken, Philippe Foubert, Aiwen Wu, Jad Jaber, James Hamzik

Proceedings Volume 10146, 101462A (2017) https://doi.org/10.1117/12.2258582

KEYWORDS: Lithography, Photoresist materials, Immersion lithography, Semiconducting wafers, Line width roughness, Line edge roughness, Scanning electron microscopy, Particles, Bridges, Finite element methods, Fermium, Frequency modulation

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Proceedings Article | 20 March 2015 Paper

Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography

L. D'Urzo, P. Foubert, H. Stokes, Y. Thouroude, A. Xia, Aiwen Wu

Proceedings Volume 9425, 94251J (2015) https://doi.org/10.1117/12.2185599

KEYWORDS: Extreme ultraviolet, Particles, Lithography, Extreme ultraviolet lithography, Immersion lithography, Metals, Semiconducting wafers, Bridges, Molecular bridges, Scanning electron microscopy

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Proceedings Article | 31 March 2010 Paper

Defect performance of a 2X node resist with a revolutionary point-of-use filter

J. Braggin, R. Ramirez, A. Wu, W. Choi, I. Funahshi, K. Yamamoto

Proceedings Volume 7639, 76391E (2010) https://doi.org/10.1117/12.859280

KEYWORDS: Manufacturing, Lithography, Semiconducting wafers, Chemistry, Control systems, Immersion lithography, Manufacturing equipment, Filtering (signal processing), Scanning electron microscopy, Photomicroscopy

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Proceedings Article | 31 March 2010 Paper

Improving material-specific dispense processes for low-defect coatings

Brian Smith, Raul Ramirez, Jennifer Braggin, Aiwen Wu, Karl Anderson, John Berron, Nick Brakensiek, Carlton Washburn

Proceedings Volume 7639, 763929 (2010) https://doi.org/10.1117/12.846642

KEYWORDS: Semiconducting wafers, Particles, Liquids, Manufacturing, Materials processing, Data modeling, Lithography, Intelligence systems, Product engineering, Process engineering

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Proceedings Article | 24 March 2009 Paper

A study on effect of point-of-use filters on defect reduction for advanced 193nm processes

Nelson Vitorino, Elizabeth Wolfer, Yi Cao, DongKwan Lee, Aiwen Wu

Proceedings Volume 7272, 72723M (2009) https://doi.org/10.1117/12.814152

KEYWORDS: Semiconducting wafers, Particles, 193nm lithography, Lithography, Manufacturing, Scanning electron microscopy, Critical dimension metrology, Polymers, Composites, Bottom antireflective coatings

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Proceedings Article | 4 December 2008 Paper

A technique for rapid elimination of microbubbles for photochemical filter startup

Aiwen Wu, Wailup Chow

Proceedings Volume 7140, 71402Y (2008) https://doi.org/10.1117/12.804691

KEYWORDS: Liquids, Particles, Microfluidics, Semiconducting wafers, Optical filters, Optical lithography, Cavitation, Molecules, Optical proximity correction, Roads

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Proceedings Article | 3 April 2008 Paper

Effect of nanofiltration on photochemical integrity

H. Zhang, A. Wu, J. Wei, R. Buschjost

Proceedings Volume 6923, 69233H (2008) https://doi.org/10.1117/12.772815

KEYWORDS: Photoresist materials, Polymers, Particles, Lithography, Semiconductors, Chemistry, Semiconducting wafers, Chemical analysis, Etching, Spectroscopy

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Showing 5 of 16 publications

Conference Committee Involvement (3)

Advances in Patterning Materials and Processes XL

27 February 2023 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIX

25 April 2022 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXVIII

22 February 2021 | Online Only, California, United States

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