Dr. Andrew J. Merriam Profile

Dr. Andrew J. Merriam

President at Lumeras LLC

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Author

Publications (9)

Proceedings Article | 28 February 2009 Paper

Spectral narrowing and tunability of a high-power diffraction-limited ns-pulsed OPO/OPA system using transversely-chirped and temperature-tuned volume Bragg gratings

Andrew Merriam, Vadim Smirnov, Leon Glebov

Proceedings Volume 7193, 71930R (2009) https://doi.org/10.1117/12.809405

KEYWORDS: Optical parametric oscillators, Fiber Bragg gratings, Crystals, Diffraction gratings, Output couplers, Ferroelectric materials, Diffraction, Ultraviolet radiation, Mirrors, Optical amplifiers

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Proceedings Article | 26 March 2007 Paper

A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography

Andrew Merriam, Donald Bethune, John Hoffnagle, William Hinsberg, C. Michael Jefferson, James Jacob, Timothy Litvin

Proceedings Volume 6520, 65202Z (2007) https://doi.org/10.1117/12.712210

KEYWORDS: Semiconducting wafers, Interferometry, Visibility, Solid state lasers, Immersion lithography, Laser sources, Photoresist materials, Prisms, Interferometers, Lithography

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Proceedings Article | 9 November 2005 Paper

Development of an actinic photomask review and phase metrology tool for 193-nm lithography

Andrew Merriam, James Jacob

Proceedings Volume 5992, 59924J (2005) https://doi.org/10.1117/12.632309

KEYWORDS: Photomasks, Optical parametric oscillators, Metrology, Ultraviolet radiation, Nonlinear crystals, Crystals, Solid state lasers, CCD cameras, Microscopes, Nd:YAG lasers

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Proceedings Article | 10 May 2005 Paper

Optical considerations of high-resolution photomask phase metrology

A. Merriam, J. Jacob

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.606107

KEYWORDS: Photomasks, Metrology, Objectives, Interferometry, Interferometers, Phase shifts, Microscopes, Imaging systems, Fringe analysis, Excimer lasers

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Proceedings Article | 6 December 2004 Paper

Development of a 5-kHz solid state 193-nm actinic light source for photomask metrology and review

James Jacob, Andrew Merriam

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569428

KEYWORDS: Optical parametric oscillators, Crystals, Photomasks, Metrology, Ultraviolet radiation, Light sources, Nonlinear crystals, Solid state lasers, Solid state physics, Laser crystals

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Proceedings Article | 6 December 2004 Paper

High-resolution actinic imaging and phase metrology of 193-nm CPL reticles

Andrew Merriam, James Jacob, Douglas Van Den Broeke, Stephen Hsu, J. Fung Chen, Bryan Kasprowicz

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569274

KEYWORDS: Photomasks, Metrology, Fringe analysis, Phase shifts, Phase measurement, Etching, Interferometers, Reticles, Microscopes, Quartz

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Proceedings Article | 17 December 2003 Paper

Semiconductor wafer printing simulation by digital apodization of high-resolution actinic photomask images

James Jacob, Andrew Merriam, Ken Rebitz

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518184

KEYWORDS: Photomasks, Inspection, Spatial frequencies, Semiconducting wafers, Apodization, Digital filtering, Modulation transfer functions, Optical filters, Microscopes, Image filtering

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Proceedings Article | 27 December 2002 Paper

High-resolution photomask phase measurement tool

Andrew Merriam, James Jacob

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467846

KEYWORDS: Photomasks, Phase shifts, Phase measurement, Interferometers, Fringe analysis, Spatial resolution, Metrology, Data acquisition, Image resolution, Wavefronts

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Proceedings Article | 16 July 2002 Paper

High-resolution photomask transmission and phase measurement tool

Jim Jacob, Tim Litvin, Andrew Merriam

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473409

KEYWORDS: Photomasks, Phase measurement, Phase shifts, Transmittance, Cameras, Laser beam diagnostics, Objectives, Attenuators, Binary data, Light sources

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Showing 5 of 9 publications

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