Dr. Anwei Liu
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 September 2009 Paper
Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, Apo Sezginer
Proceedings Volume 7488, 748815 (2009) https://doi.org/10.1117/12.829938
KEYWORDS: SRAF, Photomasks, Model-based design, Optimization (mathematics), Printing, Semiconducting wafers, Systems modeling, Resolution enhancement technologies, Optical proximity correction, Alternate lighting of surfaces

Proceedings Article | 11 May 2009 Paper
Bayram Yenikaya, Oleg Alexandrov, Steven Chen, Anwei Liu, Ali Mokhberi, Apo Sezginer
Proceedings Volume 7379, 73792Z (2009) https://doi.org/10.1117/12.824350
KEYWORDS: SRAF, Photomasks, Model-based design, Lithography, Printing, Optimization (mathematics), Electroluminescence, Critical dimension metrology, Lithographic illumination, Systems modeling

Proceedings Article | 30 October 2007 Paper
Kiyoshi Kageyama, Katsuyuki Miyoko, Yoshimitsu Okuda, Gökhan Perçin, Apo Sezginer, Jesus Carrero, Alan Zhu, Anwei Liu
Proceedings Volume 6730, 67302Y (2007) https://doi.org/10.1117/12.746796
KEYWORDS: Photomasks, Databases, Calibration, Process modeling, Critical dimension metrology, Data modeling, Semiconducting wafers, Glasses, Etching, Model-based design

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