Polymer blending is a powerful approach to expand the nanopatterning landscape for block copolymer (BCP) directed self-assembly, itself a promising route to enhance resolution in established lithography techniques. However, investigating the vast and complex parameter spaces associated with blend self-assembly remains a daunting challenge. This talk will highlight examples where blending BCPs with homopolymers can dramatically speed up self-assembly kinetics for potential applications from nanophotonics to membrane synthesis, while blending two BCPs enables registered, template-responsive pattern selection. I will further describe ongoing efforts to accelerate investigations of blend formulation and processing using new combinatorial and autonomous methods.
Improvements in ordering kinetics and pattern diversity are needed to make block copolymer directed self-assembly (BCP DSA) a route to cost-effective, large-area nanomanufacturing. This talk will highlight recent research in BCP DSA with these goals in mind. First, I will describe how self-templating in layered BCP thin films produces new 3D pattern symmetries. Second I will show how chemical patterning can be used to locally select between coexisting cylinder and lamellae morphologies in BCP blends. Finally, I will discuss the use of homopolymer plasticizers to accelerate ordering, enabling self-assembly at the > ~100 nm scale relevant for optical dielectric metasurfaces.
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