CONFERENCE PROCEEDINGS
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Benjamin L. Alles
at Technische Univ München
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Author
Publications (4)
Proceedings Article | 7 March 2008 Paper
Modeling the work piece charging during e-beam lithography
Benjamin Alles, Eric Cotte, Bernd Simeon, Timo Wandel
Proceedings Volume 6924, 69244P (2008) https://doi.org/10.1117/12.776651
KEYWORDS: Photomasks, Quantum efficiency, Particles, Tin, Electron beams, Diffusion, Electron beam lithography, Fourier transforms, Semiconducting wafers, Instrument modeling
Proceedings Article | 3 May 2007 Paper
An empirical approach adressing the transfer of mask placement errors during exposure
B. Alles, B. Simeon, E. Cotte, T. Wandel, B. Schulz, R. Seltmann
Proceedings Volume 6533, 65330U (2007) https://doi.org/10.1117/12.736958
KEYWORDS: Photomasks, Semiconducting wafers, Error analysis, Statistical analysis, Image registration, Overlay metrology, Dysprosium, Data modeling, Statistical modeling, Metals
Proceedings Article | 4 April 2007 Paper
Meeting overlay requirements for future technology nodes with in-die overlay metrology
Proceedings Volume 6518, 65180E (2007) https://doi.org/10.1117/12.708471
KEYWORDS: Overlay metrology, Reticles, Semiconducting wafers, Image registration, Photomasks, Data modeling, Pellicles, Scanners, Error analysis, Metrology
Proceedings Article | 20 October 2006 Paper
Analysis of the Vistec LMS IPRO3 performance and accuracy enhancement techniques
Gunter Antesberger, Sven Knoth, Frank Laske, Jens Rudolf, Eric Cotte, Benjamin Alles, Carola Bläsing, Wolfgang Fricke, Klaus Rinn
Proceedings Volume 6349, 63491M (2006) https://doi.org/10.1117/12.686089
KEYWORDS: Error analysis, Reticles, Distortion, Calibration, Photomasks, Image registration, Statistical analysis, Ceramics, Statistical methods, Interferometers
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