Dr. Bing Han
at Univ of Trento
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 May 2011 Paper
Proceedings Volume 8069, 80690K (2011) https://doi.org/10.1117/12.886820
KEYWORDS: Waveguides, Silicon, Photoresist materials, Refractive index, Lithography, Light wave propagation, Photomasks, Grayscale lithography, Silica, Finite-difference time-domain method

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