Mr. Brad J. Eichelberger Profile

Brad J. Eichelberger

Production Marketing Manager at KLA Corp

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Author

Publications (11)

Proceedings Article | 24 March 2009 Paper

Advanced modeling strategies to improve overlay control for 32-nm lithography processes

Anna Minvielle, Lovejeet Singh, Jeffrey Schefske, Joerg Reiss, Eric Kent, Terry Manchester, Brad Eichelberger, Kelly O'Brien, Jim Manka, John Robinson, David Tien

Proceedings Volume 7272, 72722X (2009) https://doi.org/10.1117/12.814256

KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Scanners, Radium, Lithography, Visualization, Performance modeling, Immersion lithography, Double patterning technology

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Proceedings Article | 7 March 2008 Paper

32nm overlay improvement capabilities

Brad Eichelberger, Kevin Huang, Kelly O'Brien, David Tien, Frank Tsai, Anna Minvielle, Lovejeet Singh, Jeffrey Schefske

Proceedings Volume 6924, 69244C (2008) https://doi.org/10.1117/12.773014

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Double patterning technology, Performance modeling, Data modeling, Lithography, Optical lithography, Statistical modeling

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Proceedings Article | 5 April 2007 Paper

Improved overlay control through automated high order compensation

S. Wakamoto, Y. Ishii, K. Yasukawa, A. Sukegawa, S. Maejima, A. Kato, J. Robinson, B. Eichelberger, P. Izikson, M. Adel

Proceedings Volume 6518, 65180J (2007) https://doi.org/10.1117/12.712710

KEYWORDS: Scanners, Distortion, Databases, Semiconducting wafers, Overlay metrology, Reticles, Control systems, Optical alignment, Lithography, Error analysis

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Proceedings Article | 5 April 2007 Paper

Litho cell control using MPX

Eric Apelgren, Harold Kennemer, Chris Nelson, Brad Eichelberger, John Robinson

Proceedings Volume 6518, 65182R (2007) https://doi.org/10.1117/12.712694

KEYWORDS: Semiconducting wafers, Scanners, Finite element methods, Metrology, Image processing, Calibration, Reticles, Data modeling, Wafer testing, Wafer-level optics

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Proceedings Article | 24 March 2006 Paper

Improving scanner productivity and control through innovative connectivity application

Yuuki Ishii, Shinji Wakamoto, Atsuhiko Kato, Brad Eichelberger

Proceedings Volume 6152, 615247 (2006) https://doi.org/10.1117/12.656094

KEYWORDS: Overlay metrology, Distortion, Scanners, Semiconducting wafers, Phase modulation, Metrology, Databases, Optical alignment, Control systems, Error analysis

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Proceedings Article | 10 May 2005 Paper

Separating cluster contribution to improve CD distribution using simultaneous dose-focus monitoring on production wafers

Louis-Pierre Armellin, Virginie Dureuil, Olivier Guillaume, Philippe Alet, Brad Eichelberger, Michel Egreteau, Marco Polli, Berta Dinu

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598045

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Scanning electron microscopy, Finite element methods, Calibration, Control systems, Diagnostics, Temperature metrology, Statistical modeling

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Proceedings Article | 10 May 2005 Paper

Cost effective CD control for DUV implant layers using the Archer MPX focus-exposure monitor

Sean Hannon, Brad Eichelberger, Chris Nelson, Berta Dinu, Harold Kennemer, Kevin Monahan

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600130

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Metrology, Finite element methods, Scanners, Overlay metrology, Data modeling, Nano opto mechanical systems, Standards development

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Proceedings Article | 24 May 2004 Paper

Effect of inline dose and focus monitoring and control on post-etch CD

Berta Dinu, Venkatram Subramony, Pei Chin Lim, Dawn Goh, Brad Eichelberger, Kwong Boo Chew, Kevin Monahan

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535241

KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Data modeling, Standards development, Lithography, Process control, Finite element methods, Optical testing, Optical lithography

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Proceedings Article | 24 May 2004 Paper

Edge die focus-exposure monitoring and compensation to improve CD distributions

Brad Eichelberger, Venkatram Subramony, Augustine Chew, Berta Dinu, Dawn Goh, Pei Chin Lim, Kevin Monahan

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535196

KEYWORDS: Semiconducting wafers, Etching, Scanners, Metrology, Yield improvement, Overlay metrology, Finite element methods, Critical dimension metrology, Scanning electron microscopy, Wafer-level optics

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Proceedings Article | 29 April 2004 Paper

Yield loss in lithographic patterning at the 65nm node and beyond

Kevin Monahan, Brad Eichelberger, Matt Hankinson, John Robinson, Mike Slessor

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.537349

KEYWORDS: Critical dimension metrology, Lithography, Semiconducting wafers, Process control, Spectroscopic ellipsometry, Metrology, Manufacturing, Overlay metrology, Photomasks, Resolution enhancement technologies

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Proceedings Article | 2 June 2003 Paper

Simultaneous dose and focus monitoring on product wafers

Brad Eichelberger, Berta Dinu, H. Pedut

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483473

KEYWORDS: Semiconducting wafers, Metrology, Finite element methods, Scanners, Calibration, Data modeling, Phase modulation, Critical dimension metrology, Atrial fibrillation, Microelectronics

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Showing 5 of 11 publications

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