Mr. Cheolwoo Lee Profile

Cheolwoo Lee

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 10 April 2024 Presentation + Paper

Device overlay root cause process detection using patterned wafer geometry information

Sejung Ham, Youngkwang Song, Cheolwoo Lee, Mingyu Kim, Minsung Hyun, Sunghyun Park, Moonsoup Kim, Jeonghoon Lee, Nanglyeom Oh, Sunglyul Park, Dongsub Choi

Proceedings Volume 12955, 129551D (2024) https://doi.org/10.1117/12.3008290

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical alignment, Vacuum chambers, Lithography, Scanners, Optical parametric oscillators, Process control, Error analysis, 3D metrology

Read Abstract +

On-product overlay (OPO) is a critical inline process control parameter in semiconductor manufacturing. One of the main factors that induce the overlay error is non-lithography processes like etching, deposition and cleaning. The overlay margin is getting tighter as the device technology advances and detecting the root cause of process-induced overlay error is a main problem to improving the OPO. However, it is not an easy problem to solve due to the lack of inline monitoring data on non-lithography processes. Even if we evaluate inline monitoring data, it is too sparse to do in-depth analysis compared to abundant lithographic overlay data. Instead, we can make use of data from the PWG patterned wafer geometry metrology system, which can measure high-density data with high throughput. In this paper, we introduce a comprehensive method of detecting the root cause of the process-induced overlay errors based on inline PWG data. Our target device is a 3D NAND product with process-induced overlay errors due to wafer geometry. We start our analysis by tracing PWG GEN3 data for the same wafer in a wide process step range. We compare the GEN3 signature to an overlay error signature of a target lithography layer to filter out suspicious processes. From the suspicious processes, we derived optimized KPIs that discriminate between good and bad wafers in terms of process-induced overlay errors, which are then used as a monitoring metric. With the optimized KPIs, we discern which process is the root cause of process-induced overlay errors to help drive corrective actions and improve OPO on the target device. Finally, we propose a comprehensive framework that is not limited to PWG data but applies to other available inline data such as alignment, ADI and AEI overlay and NZO.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years