In this paper, we will be discussing the repair of 193 nm Molybdenum Silicide (MoSiON) phase-shift masks by Focused Ion Beam (FIB) technology. Development of a next generation FIB column has allowed greater resolution of photomask patterns enabling efficient repair of 193 nm MoSiON phase-shift mask defects in patterns as small as 480 nm on the mask. The capabilities of this next generation VisIONT ion beam column achieve enhanced imaging at lower ion beam currents, minimizing damage to the substrate material while improving repair profiles. Both clear defects and opaque defects were investigated.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.