Mr. Ki-Yeop Chris Park Profile

Ki-Yeop Chris Park

Senior Eng'r at ASML Korea Co Ltd

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 28 March 2017 Presentation + Paper

Presentation + Paper

The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate

Boo-Hyun Ham, Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Jangho Shin, Ki-Yeop Park, Sean Park, Lei Liu, Ming-Chun Tien, Angelique Nachtwein, Marinus Jochemsen, Philip Yan, Vincent Hu, Christopher Jones

Proceedings Volume 10145, 101451P (2017) https://doi.org/10.1117/12.2257964

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

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Proceedings Article | 24 March 2016 Paper

Paper

OPC optimization techniques for enabling the reduction of mismatch between overlay metrology and the device pattern cell

Shinyoung Kim, Chanha Park, Jinhyuck Jun, Jaehee Hwang, Hyunjo Yang, Nang-Lyeom Oh, Sean Park, Chris Park, Kyu-Tae Sun, Youping Zhang, Paul Tuffy

Proceedings Volume 9778, 97781S (2016) https://doi.org/10.1117/12.2219467

KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

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Proceedings Article | 19 March 2015 Paper

Paper

Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets

Young-Sik Kim, Young-Sun Hwang, Mi-Rim Jung, Ji-Hwan Yoo, Won-Taik Kwon, Kevin Ryan, Paul Tuffy, Youping Zhang, Sean Park, Nang-Lyeom Oh, Chris Park, Mir Shahrjerdy, Roy Werkman, Kyu-Tae Sun, Jin-Moo Byun

Proceedings Volume 9424, 942414 (2015) https://doi.org/10.1117/12.2085645

KEYWORDS: Overlay metrology, Metrology, Target detection, Semiconducting wafers, Optical proximity correction, Resolution enhancement technologies, Reticles, Lithography, Optical lithography, Etching

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Proceedings Article | 2 April 2014 Paper

Paper

High-precision self-tool CD matching with focus-target assist pattern by computational ways

Sung-Man Kim, Hyun-Chul Kim, Jung-Woo Lee, Young-Seok Kim, Yong-Ho Kim, Sung-Keun Won, Sung-il (Andrew) Kim, Ki-Yeop (Chris) Park, Chang-Hoon Ryu, Qi-Tong Fan, Ki-Ho Baik

Proceedings Volume 9050, 90502X (2014) https://doi.org/10.1117/12.2047272

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Control systems, Photoresist processing, Scanners, Image processing, Finite element methods, Optical proximity correction, Imaging systems, Lithography

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Proceedings Article | 12 April 2013 Paper

Paper

Lens heating impact analysis and controls for critical device layers by computational method

Du Hyun Beak, Jin Phil Choi, Tony Park, Young Sun Nam, Young Seog Kang, Chan-Hoon Park, Ki-Yeop(Chris) Park, Chang-Hoon Ryu, Wenjin Huang, Ki-Ho Baik

Proceedings Volume 8683, 86831Q (2013) https://doi.org/10.1117/12.2012135

KEYWORDS: Photomasks, Wavefronts, Calibration, 3D modeling, Scanners, Control systems, Semiconducting wafers, Data modeling, Reticles, Diffraction

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Proceedings Article | 23 March 2011 Paper

Paper

Advanced scanner matching using freeform source and lens manipulators

Jong-Ho Lim, Kyung Kang, Sung-Man Kim, Wenjin Shao, Fei Du, Zhengfan Zhang, Zongchang Yu, John Barbuto, Venu Vellanki, Yu Cao, Ronald Goossens, Seung-Hoon Park, Chris Park, Stefan Hunsche, Junwei Lu

Proceedings Volume 7973, 79732A (2011) https://doi.org/10.1117/12.881680

KEYWORDS: Scanners, Semiconducting wafers, Birefringence, Critical dimension metrology, Diffractive optical elements, Metrology, Cadmium, Fiber optic illuminators, Data modeling, Computational lithography

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Proceedings Article | 23 March 2011 Paper

Paper

Scanner matching using pupil intensity control between scanners in 30nm DRAM device

Jongwon Jang, Daejin Park, Jeaseung Choi, Areum Jung, Gyun Yoo, Jungchan Kim, Cheol-kyun Kim, Donggyu Yim, Junwei Lu, Seunghoon Park, Zongchang Yu, Venu Vellanki, Wenkin Shao, Chris Park

Proceedings Volume 7973, 79730S (2011) https://doi.org/10.1117/12.879570

KEYWORDS: Scanners, Critical dimension metrology, Semiconducting wafers, Cadmium, Calibration, Data modeling, Computer simulations, Metrology, Control systems, Lithography

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Proceedings Article | 4 March 2010 Paper

Paper

Analysis of the impact of pupil shape variation by pupil fit modeling

Jin-hyuck Jeon, Chan-ha Park, Hyun-jo Yang, Cheol-kyun Kim, Jin-young Choi, Sang-jin Oh, Dong-gyu Yim, Sung-ki Park, Ki-yeop Park, Young-hong Min, Andre Engelen, Bart Smeets, Joerg Zimmermann

Proceedings Volume 7640, 76400Y (2010) https://doi.org/10.1117/12.846703

KEYWORDS: Scanners, Critical dimension metrology, Shape analysis, Optical proximity correction, Fiber optic illuminators, Semiconducting wafers, Lithography, Control systems, Instrument modeling, Process control

Read Abstract +

As K1 factor for mass-production of memory devices has been decreased to almost its theoretical limit, the process window of lithography is getting much smaller and the production yield has become more sensitive to even small variations of the process in lithography. So it is necessary to control the process variations more tightly than ever. In mass-production, it is very hard to extend the production capacity if the tool-to-tool variation of scanners and/or scanner stability through time is not minimized. One of the most critical sources of variation is the illumination pupil. So it is critical to qualify the shape of pupils in scanners to control tool-to-tool variations. Traditionally, the pupil shape has been analyzed by using classical pupil parameters to define pupil shape, but these basic parameters, sometimes, cannot distinguish the tool-to-tool variations. It has been found that the pupil shape can be changed by illumination misalignment or damages in optics and theses changes can have a great effect on critical dimension (CD), pattern profile or OPC accuracy. These imaging effects are not captured by the basic pupil parameters. The correlation between CD and pupil parameters will become even more difficult with the introduction of more complex (freeform) illumination pupils. In this paper, illumination pupils were analyzed using a more sophisticated parametric pupil description (Pupil Fit Model, PFM). And the impact of pupil shape variations on CD for critical features is investigated. The tool-to-tool mismatching in gate layer of 4X memory device was demonstrated for an example. Also, we interpreted which parameter is most sensitive to CD for different applications. It was found that the more sophisticated parametric pupil description is much better compared to the traditional way of pupil control. However, our examples also show that the tool-to-tool pupil variation and pupil variation through time of a scanner can not be adequately monitored by pupil parameters only, The best pupil control strategy is a combination of pupil parameters and simulated CD using measured illumination pupils or modeled pupils.

Proceedings Article | 16 March 2009 Paper

Paper

The analysis of polarization characteristics on 40nm memory devices

Minae Yoo, Chanha Park, Taejun You, Hyunjo Yang, Young-Hong Min, Ki-Yeop Park, Donggyu Yim, Sungki Park

Proceedings Volume 7274, 72742W (2009) https://doi.org/10.1117/12.814087

KEYWORDS: Polarization, Critical dimension metrology, Semiconducting wafers, Lithography, Optical lithography, Resolution enhancement technologies, Polarization control, Fiber optic illuminators, Semiconductors, Metrology

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Proceedings Article | 4 December 2008 Paper

Paper

Lithography performance and simulation accuracy at different polarization states for sub 40nm node

Ki-Yeop Park, Ho-young Kang, Gratiela Isai, Khalid Elbattay, Peter van Oorschot, Stuart Young, Seung-Chul Oh, Young-Hong Min, Sung-Goo Hong, Youn-Tak Park

Proceedings Volume 7140, 71403N (2008) https://doi.org/10.1117/12.804732

KEYWORDS: Polarization, Nanoimprint lithography, Photomasks, 3D image processing, 3D modeling, Chromium, 3D displays, Lithography, Computer simulations, Device simulation

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Proceedings Article | 12 May 2005 Paper

Paper

The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance

Chang-Young Jeong, Jun-Kyu Ahn, Ki-Yeop Park, Jae Choi, Jeong Lee

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600418

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Lithography, Optical lithography, Monochromatic aberrations, Optical proximity correction, Phase shifts, Interferometers, Semiconductors

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Proceedings Article | 28 May 2004 Paper

Paper

The evaluation of assist feature defect printability for sub-0.13-μm technology

Chang-Young Jeong, Young Kim, Ki-Yeop Park, Jae Choi, Jeong Lee

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536115

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Optical proximity correction, Inspection, Printing, Scanning electron microscopy, Photography, Semiconductors, Distortion

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Proceedings Article | 14 May 2004 Paper

Paper

Integration using inorganic BARC in a via first dual-damascene process with low-k dielectric

Jun Kyu Ahn, Seon Ho Choi, Young Keun Kim, Ki Yeop Park, Jae Sung Choi, Eun Suk Hong, Kang Sup Shin, Si Bum Kim, Kyeong Keun Choi, Sung Bo Hwang, Jeong Gun Lee

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536282

KEYWORDS: Etching, Optical lithography, Dielectrics, Lithography, Critical dimension metrology, Photoresist materials, Photoresist processing, Chemistry, Scanning electron microscopy, Oxygen

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Proceedings Article | 26 June 2003 Paper

Paper

Impact of mask defect in a high MEEF process

Chang-Young Jeong, Ki-Yeop Park, Jae-Sung Choi, Jeong-Gun Lee, Dai-Hoon Lee

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485514

KEYWORDS: Photomasks, Critical dimension metrology, Lithium, Chromium, Nanoimprint lithography, Inspection, Semiconductors, Optical lithography, Semiconducting wafers, Lithographic illumination

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Proceedings Article | 16 July 2002 Paper

Paper

CD-SEM calibration with TEM to reduce CD measurement error

Chang-Young Jeong, Joohyoung Lee, Ki-Yeop Park, Won Lee, Dai-Hoon Lee

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473519

KEYWORDS: Critical dimension metrology, Calibration, Transmission electron microscopy, Line edge roughness, Semiconducting wafers, Semiconductors, Silicon, Process control, Standards development, Logic devices

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Proceedings Article | 23 June 2000 Paper

Paper

Improvement of resist profile roughness in bilayer resist process

Chang-Young Jeong, Sang-Wook Ryu, Ki-Yeop Park, Won-Kyu Lee, Seung-Woog Lee, Dai-Hoon Lee

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388368

KEYWORDS: Photoresist processing, Critical dimension metrology, Line edge roughness, Image processing, Deep ultraviolet, Optical lithography, Silicon, Etching, Lithography, Reactive ion etching

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Proceedings Article | 2 June 2000 Paper

Paper

Reduction of wafer-scale error between DI and FI in multilevel metallization by adjusting edge detection method

Sang-Gil Bae, Young-Keun Kim, Ki-Yeop Park, Jin-Soo Kim, Won-Kyu Lee, S.W. Lee, Dai-Hoon Lee

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386502

KEYWORDS: Semiconducting wafers, Electronic design automation, Aluminum, Overlay metrology, Metals, Edge detection, Photomasks, Optical lithography, Detection and tracking algorithms, Inspection

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Proceedings Article | 29 June 1998 Paper

Paper

Optimization of ARC process in DUV lithography

Kyung-Jin Shim, Byoung-Il Choi, Ki-Yeop Park, Won-Kyu Lee

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310801

KEYWORDS: Reflectivity, Photoresist materials, Critical dimension metrology, Lithography, Deep ultraviolet, Refractive index, Semiconducting wafers, Antireflective coatings, Silicon, Amorphous silicon

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Proceedings Article | 7 July 1997 Paper

Paper

Process optimization by reducing I-D bias for 0.25-um logic devices

Ki-Yeop Park, Byoung-Il Choi, Won-Kyu Lee, Chul-Gi Ko

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276017

KEYWORDS: Logic devices, Photoresist processing, Structural design, Deep ultraviolet

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Proceedings Article | 17 May 1994 Paper

Paper

Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology

Young-Mog Ham, YoungSik Kim, Ikboum Hur, Ki-Yeop Park, Hung-Eil Kim, Dong-Jun Ahn, Soo-Han Choi

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175419

KEYWORDS: Photomasks, Photoresist processing, Phase shifts, Transmittance, Image processing, Semiconducting wafers, Lithography, Process control, Metals, Phase shifting

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Showing 5 of 20 publications

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