Ms. Emma Litterio Profile

Emma Litterio

at STMicroelectronics SRL

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Author

Publications (5)

Proceedings Article | 25 May 2022 Poster + Paper

Lowering the photoresist swing effect to increase the lithographic critical dimension uniformity: one step ahead in perfecting the dual Damascene module

Valentina Dall'Asta, Emma Litterio, Nicoletta Corneo, Bertrand Le-Gratiet, Tito Flavio Bellunato

Proceedings Volume 12055, 120550W (2022) https://doi.org/10.1117/12.2614005

KEYWORDS: Semiconducting wafers, Lithography, Silicon, Reflectivity, Photoresist materials, Photomasks, Scanning electron microscopy, Photomicroscopy

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Proceedings Article | 22 February 2021 Presentation + Paper

Chemistry working for lithography: the Marangoni-effect-based single layer for enhanced planarization

Valentina Dall'Asta, Emma Litterio, Nicoletta Corneo, Jakub Koza, Jonathan Jeauneau, Chiara Bertarelli, Eusebio Barozzi, Tito Bellunato

Proceedings Volume 11612, 116120E (2021) https://doi.org/10.1117/12.2583933

KEYWORDS: Lithography, Chemistry, Yield improvement, Semiconductor manufacturing, Semiconducting wafers, Reliability, Photosensitive materials, Photoresist materials, Manufacturing

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Proceedings Article | 23 March 2020 Paper

Marangoni effect-based under-layer for a Dual Damascene via-first approach: a scalable solution to the unwanted photoresist swing effect

V. Dall'Asta, E. Litterio, N. Corneo, J. Koza, J. Jeauneau, P. Cantù

Proceedings Volume 11326, 1132622 (2020) https://doi.org/10.1117/12.2551864

KEYWORDS: System on a chip, Semiconducting wafers, Coating, Polymers, Liquids, Lithography, Scanning electron microscopy, Photoresist materials

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Proceedings Article | 20 March 2019 Paper

Experimental study of the strong halation-effect of a fully PGMEA-based under-layer on a highly etched topography in the dual damascene via-first approach

Valentina Dall'Asta, Emma Litterio, Nicoletta Corneo, Pietro Cantú

Proceedings Volume 10962, 1096213 (2019) https://doi.org/10.1117/12.2514722

KEYWORDS: Semiconducting wafers, Coating, Polymers, Scanning electron microscopy, Photomasks, Silicon, Lithography, Optical microscopy

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Proceedings Article | 20 March 2018 Paper

Characterization of metal line-width variation in via first dual-damascene approach and its modeling using machine learning artificial neural network algorithms

Pietro Cantù, Chiara Catarisano, Nicoletta Corneo, Alessandro Dundulachi, Emma Litterio, Valeria Mantovani, Matteo Patelmo, Benedetta Triulzi

Proceedings Volume 10588, 105880S (2018) https://doi.org/10.1117/12.2297256

KEYWORDS: Critical dimension metrology, Metals, Data modeling, Neural networks, Photoresist materials, Convolution, Artificial neural networks, Machine learning, Optical lithography, Evolutionary algorithms

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