Dr. Evan L. Schwartz Profile

Dr. Evan L. Schwartz

Graduate Research Assistant/PhD Candidate at Cornell Univ

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Publications (4)

Proceedings Article | 16 April 2011 Paper

Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Marie Krysak, Markos Trikeriotis, Evan Schwartz, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Warren Montgomery, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 7972, 79721C (2011) https://doi.org/10.1117/12.879385

KEYWORDS: Etching, Nanoparticles, Resistance, Oxides, Photoresist materials, Electron beam lithography, Hafnium, Lithography, Extreme ultraviolet lithography, Refractive index

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Proceedings Article | 26 March 2010 Paper

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Markos Trikeriotis, Woo Jin Bae, Evan Schwartz, Marie Krysak, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 7639, 76390E (2010) https://doi.org/10.1117/12.846672

KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Etching, Hafnium, Resistance, Oxides, Photoresist developing, Deep ultraviolet, Refractive index

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Proceedings Article | 26 March 2010 Paper

New self-assembly strategies for next-generation lithography

Evan Schwartz, Joan Bosworth, Marvin Paik, Christopher Ober

Proceedings Volume 7639, 76390G (2010) https://doi.org/10.1117/12.848409

KEYWORDS: Polymers, Lithography, Transmission electron microscopy, Polymer thin films, Annealing, Etching, Scattering, Photoresist materials, Resistance, Optical lithography

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Proceedings Article | 1 April 2009 Paper

Double-exposure materials for pitch division with 193nm lithography: requirements, results

Robert Bristol, David Shykind, Sungwon Kim, Yan Borodovsky, Evan Schwartz, Courtney Turner, Georgeta Masson, Ke Min, Katherine Esswein, James Blackwell, Nikolay Suetin

Proceedings Volume 7273, 727307 (2009) https://doi.org/10.1117/12.814352

KEYWORDS: Optical lithography, Molecules, 193nm lithography, Lithography, Absorption, Near ultraviolet, Semiconducting wafers, Absorbance, Xenon, Manufacturing

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