Mr. Firoz A. Ghadiali Profile

Firoz A. Ghadiali

Eng. Tech. Dev. Manager at Intel Corp

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Publications (8)

Proceedings Article | 21 November 2023 Presentation + Paper

Die-to-database inspections of optical patterned masks

Christopher Wieland, Kristy Kormondy, Annelise Beck, Britain Smith, Firoz Ghadiali, Jun Kim, Frank Abboud, Tetsuya Sendoda, Naonari Kondo, Tomohiro Imahoko, Jeoung Kim, Chikato Kaga, Arosha Goonesekera, Wonil Cho, Sankaranarayanan Paninjath, Saikiran Madhusudhan, Prakash Deep, Shivam Nln, Sasidhara Reddy, Ranganadh Peesapati

Proceedings Volume 12751, 1275105 (2023) https://doi.org/10.1117/12.2688267

KEYWORDS: Inspection, Defect inspection, Photomasks, Optical inspection, Semiconducting wafers, Printing, Image processing, Detection and tracking algorithms, Defect detection

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Proceedings Article | 23 March 2021 Presentation + Paper

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Yoshihiko Sato, Kazuya Aoki, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Firoz Ghadiali, Frank Abboud, Steven Carson

Proceedings Volume 11609, 116090L (2021) https://doi.org/10.1117/12.2588788

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Proceedings Article | 23 March 2020 Paper

EUV mask infrastructure and actinic pattern mask inspection

Ted Liang, Yoshihiro Tezuka, Marieke Jager, Kishore Chakravorty, Safak Sayan, Eric Frendberg, Srinath Satyanarayana, Firoz Ghadiali, Guojing Zhang, Frank Abboud

Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

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Proceedings Article | 19 May 2008 Paper

Wafer plane inspection for advanced reticle defects

Rajesh Nagpal, Firoz Ghadiali, Jun Kim, Tracy Huang, Song Pang

Proceedings Volume 7028, 70281H (2008) https://doi.org/10.1117/12.793058

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Defect inspection, Wafer inspection, Defect detection, Lithography, Critical dimension metrology, Contamination

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Proceedings Article | 20 May 2006 Paper

Femtopulse laser-based mask repair in the DUV wavelength regime

Firoz Ghadiali, Vikram Tolani, Rajesh Nagpal, Tod Robinson, Jeff LeClaire, Ron Bozak, David Lee, Roy White

Proceedings Volume 6283, 628329 (2006) https://doi.org/10.1117/12.681779

KEYWORDS: Laser ablation, Deep ultraviolet, Electrons, Photomasks, Femtosecond phenomena, Chromium, Pulsed laser operation, Microscopes, Critical dimension metrology, Absorption

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Proceedings Article | 15 March 2006 Paper

Alt- phase-shift mask technology for 65nm logic applications

Kishore Chakravorty, Sven Henrichs, Wei Qiu, Joas Chavez, Yi-Ping Liu, Firoz Ghadiali, Karmen Yung, Nathan Wilcox, Mary Silva, Jian Ma, Ping Qu, Brian Irvine, Henry Yun, Wen-Hao Cheng, Jeff Farnsworth

Proceedings Volume 6154, 61540M (2006) https://doi.org/10.1117/12.654691

KEYWORDS: Quartz, Photomasks, Manufacturing, Etching, Optical lithography, Logic, Critical dimension metrology, Phase shifts, Optical proximity correction, Reticles

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Proceedings Article | 6 December 2004 Paper

DIVAS: fully automated simulation based mask defect dispositioning and defect management system

Saghir Munir, Daniel Bald, Vikram Tolani, Firoz Ghadiali, Barry Lieberman

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569096

KEYWORDS: Inspection, Photomasks, Databases, Semiconducting wafers, Data archive systems, Computer simulations, Image processing, Defect inspection, Lithography, Critical dimension metrology

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Proceedings Article | 2 July 2003 Paper

DIVAS: an integrated networked system for mask defect dispositioning and defect management

Saghir Munir, Dan Bald, Vikram Tolani, Firoz Ghadiali

Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.487634

KEYWORDS: Inspection, Photomasks, Databases, Computer simulations, Control systems, Semiconducting wafers, Scanning electron microscopy, Classification systems, Defect detection, Defect inspection

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Showing 5 of 8 publications

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