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Go Noya
at Merck Japan
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Publications (4)
Proceedings Article | 25 March 2016 Paper
Planarization of topography with spin-on carbon hard mask
Go Noya, Yusuke Hama, Maki Ishii, Shigemasa Nakasugi, Takanori Kudo, Munirathna Padmanaban
Proceedings Volume 9779, 97791I (2016) https://doi.org/10.1117/12.2218504
KEYWORDS: Polymers, Thin film coatings, Coating, Semiconducting wafers, Optical lithography
Proceedings Article | 29 March 2013 Paper
Underlayer and rinse materials for improving EUV resist performance
Munirathna Padmanaban, JoonYeon Cho, Takanori Kudo, Salem Mullen, Huirong Yao, Go Noya, Yuriko Matsuura, Yasuaki Ide, Jin Li, Georg Pawlowski
Proceedings Volume 8682, 868215 (2013) https://doi.org/10.1117/12.2013363
KEYWORDS: Extreme ultraviolet, Electron beam lithography, Line width roughness, Semiconducting wafers, Extreme ultraviolet lithography, Polymers, Coating, Absorption, Etching, Photoresist materials
Proceedings Article | 26 March 2013 Paper
Process enhancements for negative tone development (NTD)
Go Noya, Kazuma Yamamoto, Naoki Matsumoto, Yukie Takemura, Maki Ishii, Yoshihiro Miyamoto, Masahiro Ishii, Tatsuro Nagahara, Georg Pawlowski
Proceedings Volume 8680, 86802E (2013) https://doi.org/10.1117/12.2012077
KEYWORDS: Semiconducting wafers, Image processing, Lithography, Photoresist processing, 193nm lithography, Resolution enhancement technologies, Yield improvement, Optical lithography, Materials processing, Deep ultraviolet
Proceedings Article | 31 March 2010 Paper
Accelerating the dual damascene process time by new filling material
Kung-Hsun Tsao, Yu-Huan Liu, Tsz-Yuan Chen, Chih-Jung Chen, C. Huang, Yung-Cheng Chang, Go Noya, Nick Hsiao, Simon Chiu, Vencent Chang, Tomohide Katayama, Hisashi Motobayashi
Proceedings Volume 7639, 76392A (2010) https://doi.org/10.1117/12.855997
KEYWORDS: Etching, Coating, Lithography, Optical lithography, Yield improvement, Semiconducting wafers, Absorption, Chemistry, Reflectivity, Natural surfaces
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